Thin Films on Silicon

Electronic and Photonic Applications

This volume provides a broad overview of the fundamental materials science of thin films that use silicon as an active substrate or passive template, with an emphasis on opportunities and challenges for practical applications in electronics and photonics. It covers three materials classes on silicon: Semiconductors such as undoped and doped Si and SiGe, SiC, GaN, and III-V arsenides and phosphides; dielectrics including silicon nitride and high-k, low-k, and electro-optically active oxides; and metals, in particular silicide alloys. The impact of film growth and integration on physical, electrical, and optical properties, and ultimately device performance, is highlighted.

Contents:

• Foreword (Leonard C Feldman)

• Introduction (Vijay Narayanan, Martin M Frank and Alexander A Demkov)

• Semiconductors on Silicon:

  • Si, SiGe, and Si1-yCy on Si: Epitaxy of Group-IV Semiconductors for Nanoelectronics (Jean-Michel Hartmann)
  • Silicon Carbide on Silicon: 3C-SiC Buffer Layers for GaN LEDs (Jessica Chai, Li Wang and Sima Dimitrijev)
  • Epitaxy of GaN on Silicon (Yu Cao, Oleg Laboutin, Wayne Johnson, Satyaki Ganguly, Grace (Huili) Xing and Debdeep Jena)
  • III-V Semiconductors on Si: Arsenides and Phosphides for QWFET and BJT (Dmitri Lubyshev)

• Dielectrics on Silicon:

  • Low Dielectric Constant Materials for Nanoelectronics (Mikhail R Baklanov, Kris Vanstreels, Chen Wu, Yunlong Li and Kristof Croes)
  • Silicon Nitride on Si: Electronic Structure for Flash Memory Devices (Vladimir A Gritsenko)
  • High-k Oxides on Si: MOSFET Gate Dielectrics (Takashi Ando, Unoh Kwon, Siddarth Krishnan, Martin M Frank and Vijay Narayanan)
  • Materials for DRAM Memory Cell Applications (Uwe Schroeder, Kyuho Cho and Stefan Slesazeck)
  • Ferroelectric Oxides on Silicon (Alexander A Demkov and Agham-Bayan Posadas)
  • Electro-Optically Active Oxides on Silicon for Photonics (Stefan Abel and Jean Fompeyrine)

• Metals on Silicon:

  • Silicide Contacts (Ahmet S Özcan)

Readership: Graduate students and researchers in the fields of materials science, applied physics, and electrical engineering.